Operational Characteristics of Linear Sputtering Source Using Electron Cyclotron Resonance Plasma.

Electron Cyclotron Resonance Ion Source

Electron Cyclotron Resonance Ion Source

Electron Cyclotron Resonance Ion Source

TE 01 Excitation of an Electron Cyclotron Resonance Plasma Source

The uniformity of plasma generation in electron cyclotron resonance (ECR) reactors for materials processing, and the subsequent uniformity of fluxes to the substrate, are generally a function of the mode of the microwave radiation injected into the chamber. In this paper, a finite difference time domain (FDTD) simulation is used to demonstrate the consequences of exciting an ECR reactor using a...

Electron Cyclotron Resonance Source Development

The ECR ion source (ECRIS) is still an active field of research and development, as demonstrated by the numerous contributions to the ECRIS’12 workshop and ICIS’13 conference. It is impossible to present all the interesting ECR development in this paper. Instead, a selection of ECR development for linear accelerator and synchrotrons are presented along with some original recent ECR contribution...